16

Shallow junction formation using MoSi2 as diffusion source

Year:
1992
Language:
english
File:
PDF, 251 KB
english, 1992
17

Diffusion of boron and arsenic in molybdenum disilicide films

Year:
1991
Language:
english
File:
PDF, 332 KB
english, 1991
46

Codiffusion of arsenic and phosphorus implanted in silicon

Year:
1993
Language:
english
File:
PDF, 1.27 MB
english, 1993
49

Diffusion of boron in silicon during post-implantation annealing

Year:
1991
Language:
english
File:
PDF, 1.18 MB
english, 1991
50

Grain boundary segregation of oxygen and carbon in polycrystalline silicon

Year:
1987
Language:
english
File:
PDF, 461 KB
english, 1987